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SPIE Photomask Technology + EUV Lithography 2018

Sep 17 2018 - Sep 20 2018 Monterey Conference Center and Monterey Marriott Monterey, California 106

MSP, a Division of TSI, provides services and equipment for optical photomasks for development, calibration, and qualification of reticle inspection systems. With equipment for depositing particle size standards and material standards on patterned or unpatterned EUV as small as 10nm and as large as 20 um, PSL spheres can be deposited in spot patterns, ranging from 10 to 25 mm in diameter. MSP Process Particles Suspensions include 13 materials for deposition: Si, Si3N4, Al2O3, Ti, and W.