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SPIE Photomask Technology + EUV Lithography 2019

Sep 17 2019 - Sep 18 2019 Monterey Conference Center and Monterey Marriott, Monterey, California, United States 214 https://spie.org/conferences-and-exhibitions/photomask-technology--extreme-ultraviolet-lithography/exhibition?SSO=1

Our MSP team members will be attending the SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography, co-located in Monterey.

MSP, a Division of TSI, provides services and equipment for depositing particle size standards and material standards on patterned and unpatterned EUV and optical photomasks for development, calibration, and qualification of reticle inspection systems.  Particle size standards as small as 10nm (MSP NanoSilica™ Size Standards) and as large as 20µm (PSL spheres) can be deposited in spot patterns, typically 10 to 25mm in diameter.  Fifteen (15) materials are available for deposition (MSP Process Particles™ Suspensions) including Si, Si3N4, Al2O3, Ti, and W.