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MSP's PRE Challenge Wafers and Reticles

Is your cleaning system & process properly removing particles?

MSP Introduces Particle Removal Efficiency Challenge Wafers and Reticles

Validate your cleaning system and process

Uniform and Consistent Depositions

Stack of semiconductor wafersOur affordable Particle Removal Efficiency (PRE) Challenge Wafers and Reticles are deposited with NanoSilicaTM Size Standards or Process ParticlesTM Suspensions with a specified size distribution, composition, and count, which allow you to test your wafer/reticle cleaning systems and processes. MSP’s PRE Challenge Wafers/Reticles provide uniform deposition patterns across the entire substrate and a high level of consistency from wafer to wafer or reticle to reticle. These uniformly and accurately deposited reticles and wafers will provide you with the most reliable data to characterize the particle removal efficiency performance of your cleaning system/process.

MSP’s PRE Challenge Wafers and Reticles help the industry minimize excursions and increase yield

Benefits of using MSP’s PRE Challenge Wafers/Reticles

Triple-wrapped wafer fobMSP is known for its accurate and repeatable particle deposition and for its breadth in calibration standard recipes. Our experts have the knowledge to walk you through which challenge wafer/reticle recipe is right for your specific application. We offer challenge wafers/reticles in bulk orders (with a larger order offering a lower cost-per-wafer/reticle price). Also, we are a third-party selling to multiple cleaning system OEMs and fabs, providing a consistent way to compare cleaning systems/processes within the industry.


  • Research and Development: developing new wafer/reticle cleaning systems and cleaning processes
  • Manufacturing/Production: validating assembled wafer/reticle cleaning systems prior to shipment to customers (factory acceptance) and during system installation/qualification (field acceptance)
  • Service: revalidating wafer/reticle cleaning systems throughout their lifespan to ensure they are removing particles consistently across the entire surface with expected PRE levels.


Verify your system's Particle Removal Efficiency today with our PRE Challenge Wafers and Reticles

Contact us for more information!